1.

Conference Proceedings
Conference Proceedings
1. Novel silicon-containing resists for EUV and 193-nm lithography
Kessel, C. R. ; Boardman, L. D. ; Rhyner, S. J. ; Cobb, J. L. ; Henderson, C. C. ; Rao, V. ; Okoroanyanwu, U.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.214-220,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. A year in the life of an immersion lithography alpha tool at Albany Nanotech (Keynote Address) [6151-01]
Tittnich, M ; Hartley, J ; Denbeaux, G ; Okoroanyanwu, U. ; Levinson, H ; Petrillo, K. ; Robinson, C. ; Gil, D. ; Corliss, D. ; Back, D ; Brandl, S ; Schwarz, C ; Goodwin, F. ; Wei, Y. ; Martinick, B. ; Housley, R. ; Benson, P. ; Cummings, K
Pub. info.: Emerging Lithographic Technologies X.  pp.615101-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
3.

Conference Proceedings
Conference Proceedings
3. Impact of photo-induced species in O2-containing gases on lithographic patterning at 193-nm wavelength
Okoroanyanwu, U. ; Kunze, P. ; Al-Shamery, K.H. ; Romero, J. ; Bernard, J.
Pub. info.: Optical Microlithography XV.  Part One  pp.746-764,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Contamination monitoring and control on ASML MS-VII 157-nm exposure tool
Okoroanyanwu, U. ; Gronheid, R. ; Coenen, J. ; Hermans, J. ; Ronse, K.G.
Pub. info.: Optical Microlithography XVII.  pp.1695-1707,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
5.

Conference Proceedings
Conference Proceedings
5. EUV photoresist performance results from the VNL and the EUV LLC
Cobb, J.L. ; Dentinger, P.M. ; Hunter, L.L. ; O'Connell, D.J. ; Gallatin, G.M. ; Hinsberg, W.D. ; Houle, F.A. ; Sanchez, M.I. ; Domke, W.-D. ; Wurm, S. ; Okoroanyanwu, U. ; Lee, S.H.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.412-420,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
6.

Conference Proceedings
Conference Proceedings
6. Optical path and image performance monitoring of a full-field 157-nm scanner
Wells, G. ; Hermans, J. ; Watso, R. ; Kang, Y.-S. ; Morton, R. ; Kocsis, M.K. ; Okoroanyanwu, U. ; De Bisschop, P. ; Stepanenko, N. ; Ronse, K.G.
Pub. info.: Optical Microlithography XVII.  pp.91-98,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
7.

Conference Proceedings
Conference Proceedings
7. Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum UV cleaning
Okoroanyanwu, U. ; Stepanenko, N. ; Vereecke, G. ; Eliat, A. ; Kocsis, M.K. ; Kang, Y.S. ; Jonckheere, R.M. ; Conard, T. ; Ronse, K.G.
Pub. info.: Optical Microlithography XVII.  pp.487-503,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
8.

Conference Proceedings
Conference Proceedings
8. Modifications to thermophysical Behavior in ultrathin polymer films
D'Amour, J.N. ; Frank, C.W. ; Okoroanyanwu, U.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.996-1007,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
9.

Conference Proceedings
Conference Proceedings
9. Measuring thermophysical properties of ultrathin photoresist films
D'Amour, J.N. ; Frank, C.W. ; Okoroanyanwu, U.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.936-942,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690