Kotani, T. ; Ichikawa, H. ; Urakami, T. ; Nojima, S. ; Kobayashi, S. ; Oikawa, Y. ; Tanaka, S. ; Ikeuchi, A. ; Suzuki, K. ; Inoue, S.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology X. pp.628-637, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering