1.

Conference Proceedings
Conference Proceedings
1. Resolution enhancement through optical proximity correction and stepper parameter optimization for 0.12-ｦﾌm mask pattern
Oh,Y.-H. ; Lee,J.-C. ; Lim,S.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.607-613,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Optical proximity correction of critical layers in DRAM process of 0.12-μm minimum feature size
Oh,Y.-H. ; Lee,J.-C. ; Park,K.-C. ; Go,C.S. ; Lim,S.
Pub. info.: Optical Microlithography XIV.  4346  pp.1567-1574,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346