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21 results

Conference Proceedings

1. Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography

Lee, C. H. ; Han, S. ; Park, K. S. ; Kang, H. Y. ; Oh, H. W. ; Lee, J. E. ; Kim, K. M. ; Kim, Y. H. ; Kim, T. S. ; Oh, H.-K.

Pub. info.:	Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA. pp.564-571, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5753(1)

Conference Proceedings

2. Cycloolefin copolymer containing hindered hydroxyl group for 1 93nm photoresist

Kim, S.-K. ; An, I. ; Oh, H.-K. ; Lee, S. M. ; Bok, C. K. ; Moon, S. C.

Pub. info.:	Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA. pp.592-602, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5753(1)

Conference Proceedings

3. The evaluation of aberration effects according to pattern shape and duly ratio

Lee, J.-E. ; Park, S.-W. ; Lee, C.-H. ; Oh, H.-W. ; Bae, S.-Y. ; Oh, H.-K.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1738-1749, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

4. Nanomolecular resists with adamantane core for 193-nm lithography

Kim, S.-K. ; An, I. ; Oh, H.-K. ; Lee, S. M. ; Bok, C. K. ; Moon, S. C.

Pub. info.:	Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA. pp.603-610, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5753(1)

Conference Proceedings

5. EUV microexposures at the ALS using the 0.3-NA MET projection optics

Jeon, Y.-D. ; Choi, M.-K. ; Kim, E.-J. ; Kim, J.-S. ; Oh, H.-K.

Pub. info.:	Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA. pp.56-63, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5751

Conference Proceedings

6. Haze detection and haze-induced process latitude variation for low-ki 193 nm lithography [6349-105]

Kim, S.-J. ; Park, J.-B. ; Kim, S.H. ; Kang, H.-Y. ; Kang, Y.-M. ; Park, S.-W. ; An, I. ; Oh, H.-K.

Pub. info.:	Photomask Technology 2006. pp.63492T-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

7. ArF photoresist parameter optimization for mask error enhancement factor reduction [5853-60]

Lee, C. H. ; Han, S. ; Park, K. S. ; Yoon, S. ; Kang, H. Y. ; Oh, H. W. ; Lee, J. E. ; Kim, Y. H. ; Kim, T. S. ; Oh, H.-K.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.749-756, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

8. Optimization of chromeless phase mask by comparing scattering bars with zebra patterns [6154-82]

Kong, H. Y. ; Lee, J. E. ; Kwak, E.-A ; Kim, E.-J. ; Park, S.-W. ; Kim, S.-H. ; Shin, D. S. ; Jeong, H. ; Oh, H.-K.

Pub. info.:	Optical Microlithography XIX. pp.615429-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

Conference Proceedings

9. Simulation of mask induced polarization effect on imaging in immersion lithography [6154-105]

Kwak, E. A. ; Jung, M. R. ; Kim, D.-G. ; Lee, J.-E. ; Oh, H.-K. ; Lee, S.

Pub. info.:	Optical Microlithography XIX. pp.61542T-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

10.

Conference Proceedings

10. Evaluation of partial coherent imaging using the transfer function in immersion lithography [6154-103]

Jung, M. R. ; Kwak, E. A. ; Oh, H.-K. ; Shim, S.-B. ; Choi, N.-R. ; Kim, J.-S.

Pub. info.:	Optical Microlithography XIX. pp.61542R-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

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Author: Oh, H.-K.