OPC on real-world circuitry
- Author(s):
- O'Brien, S.C. ( Texas Instruments Inc. (USA) )
- Aton, T. ( Texas Instruments Inc. (USA) )
- Mason, M.E. ( Texas Instruments Inc. (USA) )
- Vickery, C. ( Texas Instruments Inc. (USA) )
- Randall, J.N. ( Zyvex Corp. (USA) )
- Publication title:
- Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5042
- Pub. Year:
- 2003
- Page(from):
- 107
- Page(to):
- 115
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448477 [0819448478]
- Language:
- English
- Call no.:
- P63600/5042
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Exposure latitude requirements for high yield with photon flux-limited laser sources
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Improving asymmetric printing and low margin using custom illumination for contact hole lithography [6156-62]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
8
Conference Proceedings
Design rule considerations for 65-nm node contact using off axis illumination
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Dual-mask model-based proximity correction for high-performance 0.10-μm CMOS process
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Study of integration issues in shallow trench isolation for deep submicron CMOS technologies
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Process capability analysis of DUV alternating PSM and DUV attenuated PSM lithography for 100-nm gate fabrication
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |