1.

Conference Proceedings
Conference Proceedings
1. Photomask fabrication feasibility for next-generation reticle format
Katsumata,M. ; Kawahira,H. ; Nozawa,S.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.198-205,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. New mask data processing system for ULSI fabrication
Takenouchi,R. ; Ohnuma,H. ; Ashida,I. ; Nozawa,S.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.178-187,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
3.

Conference Proceedings
Conference Proceedings
3. Attenuated phase-shifting mask specification with modified beam illumination
Kagami,I. ; Sugawara,M. ; Kawahira,H. ; Tsudaka,K. ; Ishikawa,K. ; Nozawa,S.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.445-456,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
4.

Conference Proceedings
Conference Proceedings
4. Defect printability study of attenuated phase-shifting masks for specifying inspection sensitivity
Sugawara,M. ; Ishikawa,K. ; Kawahira,H. ; Kagami,I. ; Nozawa,S.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.457-472,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
5.

Conference Proceedings
Conference Proceedings
5. Chemically amplified resist process for 0.25-ｦﾌm-generation photomasks
Katsumata,M. ; Kawahira,H. ; Sugawara,M. ; Nozawa,S.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.83-91,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884
6.

Conference Proceedings
Conference Proceedings
6. Influence of process latitude on exposure characteristics
Sugawara,M. ; Kawahira,H. ; Nozawa,S.
Pub. info.: Optical Microlithography IX.  Part2  pp.583-597,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
7.

Conference Proceedings
Conference Proceedings
7. Chemically amplified resist process for 0.25-ｦﾌm generation photomasks
Katsumata,M. ; Kawahira,H. ; Sugawara,M. ; Nozawa,S.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.96-104,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793
8.

Conference Proceedings
Conference Proceedings
8. Manufacturing feasibility of OPC masks for 0.25-ｦﾌm rule devices
Kawahira,H. ; Katsumata,M. ; Tsudaka,K. ; Ogura,A. ; Tomita,M. ; Nozawa,S.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.22-33,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793