1.

Conference Proceedings
Conference Proceedings
1. Etch, reticle, and track CD fingerprint corrections with local dose compensation
van der Laan, H. ; Carpaij, R. ; Krist, J. ; Noordman, O. ; van Dommelen, Y. ; van Schoot, J. ; Blok, F. ; van Os, C. ; Stegeman, S. ; Hoogenboom, T. ; Hickman, C. ; Byers, E. ; Gugel, T.
Pub. info.: Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA.  pp.107-118,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5755
2.

Conference Proceedings
Conference Proceedings
2. Optimizing and enhancing optical systems to meet the low k1 challenge
Flagello, D.G. ; Socha, R.J. ; Shi, X. ; Schoot, J.B. ; Baselmans, J. ; Kerkhof, M.A. ; Boeij, W. ; Engelen, A. ; Carpaij, R. ; Noordman, O. ; Moers, M.H.P. ; Mulder, M. ; Finders, J. ; Greevenbroek, H. ; Schriever, M. ; Maul, M. ; Haidner, H. ; Goeppert, M. ; Wegmann, U. ; Graeupner, P.
Pub. info.: Optical Microlithography XVI.  Part One  pp.139-150,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. CD uniformity improvement by active scanner corrections
van Schoot, J.B. ; Noordman, O. ; Vanoppen, P. ; Blok, F. ; Yim, D. ; Park, C.-H. ; Cho, B.-H. ; Theeuwes, T. ; Min, Y.-H.
Pub. info.: Optical Microlithography XV.  Part One  pp.304-314,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691