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Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA. pp.219-229, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Photomask and Next-Generation Lithography Mask Technology X. pp.593-599, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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