1.

Conference Proceedings
Conference Proceedings
1. The Relationship Between Deposition Characteristics and Properties of SrTiO3 Films in ECR-PEMOCVD Process
Lee, J.S. ; Bae, J.S. ; Song, H.W. ; Jun, B.H. ; Gorman, J. ; Jiang, Z.-T. ; No, K.
Pub. info.: Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11.  pp.1117-1124,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-25
2.

Conference Proceedings
Conference Proceedings
2. Characterization of retention phenomena of micron-size electrical domains in PZT thin films
Hong, S. ; Shin, H. ; Pak, Y. E. ; No, K.
Pub. info.: Multicomponent oxide films for electronics : symposium held April 6-8, 1999, San Francisco, California, U.S.A..  pp.95-,  1999.  Warrendale, PA.  MRS-Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 574
3.

Conference Proceedings
Conference Proceedings
3. Electronic structure of chromium aluminum oxynitride by DV-Xa method and photoelectron spectroscopy
Choi, Y. ; Chang, H. ; Lee, J.D. ; Kim, E. ; No, K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.455-461,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
4.

Conference Proceedings
Conference Proceedings
4. Simulation and characterization of silicon oxynitrofluoride films as a phase-shift mask material for 157-nm optical lithography
Kim, S. ; Choi, E. ; Kim, H. ; Kim, J. ; No, K.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1696-1702,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Optical properties of a-Si films for 157-nm lithography
Kim, S.K. ; Kim, Y.S. ; Kang, M.-A. ; Sohn, J.-M. ; No, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.127-135,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130