1.

Conference Proceedings
Conference Proceedings
1. Optimization of nanomachining repair condition for ArF lithography
Amano, T. ; Nishiguchi, M. ; Hashimoto, H. ; Morikawa, Y. ; Hayashi, N. ; White, R. ; Bozak, R. ; Terrill, L.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.538-545,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
2.

Conference Proceedings
Conference Proceedings
2. Advanced FIB mask repair technology for 100-nm/ArF lithography: II
Hagiwara, R. ; Yasaka, A. ; Aita, K. ; Takaoka, O. ; Koyama, Y. ; Kozakai, T. ; Doi, T. ; Muramatsu, M. ; Suzuki, K. ; Sugiyama, Y. ; Matsuda, O. ; Okabe, M. ; Shinohara, S. ; Hasuda, M. ; Adachi, T. ; Morikawa, Y. ; Nishiguchi, M. ; Sato, Y. ; Hayashi, N. ; Ozawa, T. ; Tanaka, Y. ; Yoshioka, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.510-519,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Defect repair performance using the nanomachining repair technique
Morikawa, Y. ; Kokubo, H. ; Nishiguchi, M. ; Hayashi, N. ; White, R. ; Bozak, R. ; Terrill, L.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.520-527,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. Feasibility study of manufacturing process and quality control for the new alternatingPSM structure (BACUS Best Poster)
Morikawa, Y. ; Kokubo, H. ; Nishiguchi, M. ; Nara, M. ; Totsu, Y. ; Hoga, M. ; Hayashi, N.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.224-234,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764
5.

Conference Proceedings
Conference Proceedings
5. Defect printability analysis on alternating phase-shifting masks for 193-nm lithography
Morikawa, Y. ; Totsu, Y. ; Nishiguchi, M. ; Hoga, M. ; Hayashi, N. ; Pang, L. ; Luk-Pat, G.T.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.922-934,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
6.

Conference Proceedings
Conference Proceedings
6. Advanced FIB mask repair technology for 100-nm/ArF lithography
Hagiwara, R. ; Yasaka, A. ; Aita, K. ; Takaoka, O. ; Koyama, Y. ; Kozakai, T. ; Doi, T. ; Muramatsu, M. ; Suzuki, K. ; Sugiyama, Y. ; Sawaragi, H. ; Okabe, M. ; Shinohara, S. ; Hasuda, M. ; Adachi, T. ; Morikawa, Y. ; Nishiguchi, M. ; Sato, Y. ; Hayashi, N. ; Ozawa, T. ; Tanaka, Y. ; Yoshioka, N.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1056-1064,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
7.

Conference Proceedings
Conference Proceedings
7. Defect printability analysis on alternating phase-shifting masks
Pang, L. ; Qian, Q.-D. ; Chan, K.K. ; Morikawa, Y. ; Nishiguchi, M. ; Hayashi, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.614-621,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
8.

Conference Proceedings
Conference Proceedings
8. Feasibility study of detectability and printability for TaSiOx
Nishiguchi, M. ; Morikawa, Y. ; Motonaga, T. ; Noguchi, K. ; Sasaki, S. ; Mohri, S.H. ; Hoga, M. ; Hayashi, N.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.955-963,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
9.

Conference Proceedings
Conference Proceedings
9. Study of mask process development for EUVL
Abe, T. ; Nishiguchi, M. ; Amano, T. ; Motonaga, T. ; Sasaki, S. ; Mohri, H. ; Hayashi, N. ; Tanaka, Y. ; Yamanashi, H. ; Nishiyama, I.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.832-840,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
10.

Conference Proceedings
Conference Proceedings
10. Advanced FIB mask repair technology for 90-nm/ArF lithography: III
Tanaka, Y. ; Itou, Y. ; Yoshioka, N. ; Hagiwara, R. ; Yasaka, A. ; Takaoka, O. ; Kozakai, T. ; Koyama, Y. ; Sawaragi, H. ; Sugiyama, Y. ; Muramatsu, M. ; Doi, T. ; Suzuki, K. ; Okabe, M. ; Shinohara, M. ; Matsuda, O. ; Aita, K. ; Adachi, T. ; Morikawa, Y. ; Nishiguchi, M. ; Satoh, Y. ; Hayashi, N.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.526-537,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256