1.

Conference Proceedings
Conference Proceedings
1. Advanced rf CMOS technology
Iwai,H. ; Ohguro,T. ; Morifuji,E. ; Yoshitomi,T. ; Kimijima,H. ; Momose,H.S. ; Inoh,K. ; Nii,H. ; Katsumata,Y.
Pub. info.: Design, characterization, and packaging for MEMS and microelectronics : 27-29 October 1999, Royal Pines Resort, Queensland, Australia.  pp.10-19,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3893
2.

Conference Proceedings
Conference Proceedings
2. Advanced rf CMOS technology
Iwai,H. ; Ohguro,T. ; Morifuji,E. ; Yoshitomi,T. ; Kimijima,H. ; Momose,H.S. ; Inoh,K. ; Nii,H. ; Katsumata,Y.
Pub. info.: Education in microelectronics and MEMS : 28-29 October 1999, Royal Pines Resort, Queensland, Australia.  pp.10-19,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3894
3.

Conference Proceedings
Conference Proceedings
3. Advanced rf CMOS technology
Iwai,H. ; Ohguro,T. ; Morifuji,E. ; Yoshitomi,T. ; Kimijima,H. ; Momose,H.S. ; Inoh,K. ; Nii,H. ; Katsumata,Y.
Pub. info.: Electronics and structures for MEMS : 27-29 October, 1999, Royal Pines Resort, Queensland, Australia.  pp.10-19,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3891
4.

Conference Proceedings
Conference Proceedings
4. Advanced rf CMOS technology
Iwai,H. ; Ohguro,T. ; Morifuji,E. ; Yoshitomi,T. ; Kimijima,H. ; Momose,H.S. ; Inoh,K. ; Nii,H. ; Katsumata,Y.
Pub. info.: Device and process technologies for MEMS and microelectronics : 27-29 October 1999, Royal Pines Resort, Queensland, Australia.  pp.10-19,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3892
5.

Conference Proceedings
Conference Proceedings
5. EUV mask cleaning by dry and wet processes
Nii,H. ; Kinoshita,H. ; Watanabe,T. ; Matsuo,Y. ; Sugie,Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.687-694,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
6.

Conference Proceedings
Conference Proceedings
6. Performance of Cr mask for extreme-ultraviolet lithography
Nii,H. ; Kinoshita,H. ; Watanabe,T. ; Hamamoto,K. ; Tsubakino,H. ; Sugie,Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.681-686,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409