1.

Conference Proceedings
Conference Proceedings
1. FRONT END OF LINE WET PROCESSING FOR ADVANCED CRITICAL CLEANS
Nicolosi, T. ; Olesen, M. ; George, V. ; Patel, T.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.165-172,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
2.

Conference Proceedings
Conference Proceedings
2. SUB 1OOnm PARTICLE REMOVAL WITH DEIONIZED WATER AND A MEGASONIC FREQUENCY OF 835kHz
Lauerhaas, J. ; Wu, Y. ; Xu, K. ; Vereecke, G. ; Vos, R. ; Kenis, K. ; Mertens, P. ; Nicolosi, T. ; Heyns, M.
Pub. info.: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.147-155,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-26