1.

Conference Proceedings

Conference Proceedings
Seltmann,R. ; Minvielle,A.M. ; Spence,C.A. ; Muehle,S. ; Capodieci,L. ; Nguyen,K.B.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.239-249,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings

Conference Proceedings
Plat,M.V. ; Nguyen,K.B. ; Spence,C.A. ; Lyons,C.F. ; Wilkison,A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.206-214,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings

Conference Proceedings
Pike,C. ; Bell,S. ; Plat,M.V. ; King,P. ; Nguyen,K.B. ; Lyons,C.F. ; Levinson,H.J. ; Phan,K.A. ; Okoroanyanwu,U.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.328-333,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
4.

Conference Proceedings

Conference Proceedings
Nguyen,K.B. ; Tichenor,D.A. ; Berger,K.W. ; Ray-Chaudhuri,A.K. ; Haney,S.J. ; Nissen,R.P. ; Perras,Y. ; Arling,R.W. ; Stulen,R.H. ; Fetter,L.A. ; Tennant,D.M. ; White,D.L. ; Wood,O.R.II
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.54-62,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723