1.

Conference Proceedings
Conference Proceedings
1. Prediction Method for the Life of Reverse-Osmosis Membranes
Ohya, H. ; Negishi, Y. ; Kamoto, K. ; Matsui, K. ; Inoue, H.
Pub. info.: Synthetic membranes : based on the 20th anniversary symposium honoring Drs. Loeb and Sourirajan.  pp.113-,  1981.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 153
2.

Conference Proceedings
Conference Proceedings
2. Dissolution behavior of chemically amplified resist for advanced mask- and NIL mold- making as studied by dissolution rate monitor [6283-30]
Takeshi, K. ; Oono, K. ; Negishi, Y. ; Inokuchi, D. ; Tanaka, K. ; Tamura, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831Z-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
3.

Conference Proceedings
Conference Proceedings
3. Resolution improvement of EPL stencil mask using thin membrane [6151-52]
Sugimura, H. ; Eguchi, H. ; Norimoto, M. ; Negishi, Y. ; Yonekura, I. ; Ito, K. ; Tamura, A. ; Koba, F. ; Arimoto, H
Pub. info.: Emerging Lithographic Technologies X.  pp.61511F-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
4.

Conference Proceedings
Conference Proceedings
4. Practical LEEPL masks for sub-65-nm node
Yotsui, K. ; Sumida, T. ; Negishi, Y. ; Yoshii, T. ; Tamura, A.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1268-1277,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
5.

Conference Proceedings
Conference Proceedings
5. Stencil pattern accuracy of EPL masks [5853-77]
Sugimura, H. ; Yamazaki, T. ; Susa, T. ; Negishi, Y. ; Yoshii, T. ; Eguchi, H. ; Tamura, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.884-891,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
6.

Conference Proceedings
Conference Proceedings
6. Development of positive-tone chemically amplified resist for LEEPL mask making [5853-79]
Negishi, Y. ; Takeshi, K. ; Yoshii, T. ; Tanaka, K. ; Okumoto, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.902-909,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
7.

Conference Proceedings
Conference Proceedings
7. Image placement of large window-size membrane for EPL and LEEPL mask [5853-80]
Eguchi, H. ; Sumida, T. ; Susa, T. ; Negishi, Y. ; Kurosu, T. ; Yoshii, T. ; Yamazaki, T. ; Yotsui, K. ; Sugimura, H. ; Tamura, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.910-920,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853