1.

Conference Proceedings
Conference Proceedings
1. A planarization process for multilayer lithography applications
Shih, W.-S. ; Neef, C.J. ; Daffron, M.G.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.664-672,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
2.

Conference Proceedings
Conference Proceedings
2. New BARC materials for the 65-nm node in 193-nm lithography
Neef, C.J. ; Krishnamurthy, V. ; Nagatkina, M.I. ; Bryant, E. ; Windsor, M. ; Nesbit, C.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.684-688,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
3.

Conference Proceedings
Conference Proceedings
3. New materials for 193-nm BARC application
Neef, C.J. ; Fowler, M.R. ; Windsor, M. ; Nesbit, C.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.872-877,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
4.

Conference Proceedings
Conference Proceedings
4. Novel spin-bowl-compatible, wet developable bottom anti-reflective coating for i-line applications
Krishnamurthy, V.N. ; Neef, C.J. ; Turner, S.R.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.883-890,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039