1.

Conference Proceedings
Conference Proceedings
1. Organoelement resists for EUV lithography
Dai, J. ; Ober, C.K. ; Wang, L. ; Cerrina, F. ; Nealey, P.F.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.1193-1202,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Collapse behavior of single layer 193 and 157-nm resists: use of surfactants in the rinse to realize the sub-130-nm nodes
Hien, S. ; Rich, G.K. ; Molina, G. ; Cao, H.B. ; Nealey, P.F.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.254-261,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
3.

Conference Proceedings
Conference Proceedings
3. Characterization of outgassing for EUV technology
Thirumala, V. ; Cao, H.B. ; Yueh, W. ; Choi, H. ; Golovkina, V. ; Wallace, J. ; Nealey, P.F. ; Thielman, D. ; Cerrina, F.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.765-772,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
4.

Conference Proceedings
Conference Proceedings
4. The use of surfactant in the rinse to improve collapse behavior of chemically amplified photoresists
Junarsa, I. ; Stoykovich, M.P. ; Yoshimoto, K. ; Nealey, P.F.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.842-849,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
5.

Conference Proceedings
Conference Proceedings
5. Synthesis and evaluation of novel organoelement resists for EUV lithography
Dai, J. ; Ober, C.K. ; Kim, S.-O. ; Nealey, P.F. ; Golovkina, V. ; Shin, J. ; Wang, L. ; Cerrina, F.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1164-1172,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039