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12 results

Conference Proceedings

1. Extremely fine-pitch printing with a 10×Schwarzschild optic at extreme-ultraviolet wavelengths

Shumway,M.D. ; Lee,S.H. ; Cho,C.H. ; Naulleau,P. ; Goldberg,K.A. ; Bokor,J.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.357-362, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

2. Recent advances in EUV phase-shifting point diffraction interferometry

Naulleau,P. ; Goldberg,K.A. ; Lee,S.H. ; Chang,C.C. ; Batson,P.J. ; Attwood,D.T.,Jr. ; Bokor,J.

Pub. info.:	EUV, x-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado. pp.154-163, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3767

Conference Proceedings

3. Characterization of the accuracy of EUV phase-shifting point diffraction interferometry

Naulleau,P. ; Goldberg,K.A. ; Lee,S.H. ; Chang,C. ; Bresloff,C.J. ; Batson,P.J. ; Attwood,D.T.,Jr. ; Bokor,J.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.114-123, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

Conference Proceedings

4. Holography under adverse conditions

Naulleau,P. ; Dilworth,D. ; Hoover,B. ; Lopez,J. ; Leith,E.N.

Pub. info.:	Sixth International Symposium on Display Holography, 21-25 July 1997, Lake Forest, Illinois. pp.380-387, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3358

Conference Proceedings

5. EUV holographic aerial image recording

Lee,S.H. ; Naulleau,P. ; Goldberg,K.A. ; Cho,C.H. ; Bokor,J.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.823-828, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

6. Direct comparison of EUV and visible-light interferometries

Goldberg,K.A. ; Naulleau,P. ; Lee,S.H. ; Chang,C. ; Bresloff,C.J. ; Gaughan,R.J. ; Chapman,H.N. ; Goldsmith,J.E.M. ; Bokor,J.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part2 pp.635-642, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

7. EUV scattering and flare of 10X projection cameras

Gullikson,E.M. ; Baker,S.L. ; Bjorkholm,J.E. ; Bokor,J. ; Coldberg,K.A. ; Goldsmith,J.E.M. ; Montcalm,C. ; Naulleau,P. ; Spiller,E.A. ; Stearns,D.G. ; Taylor,J.S. ; Underwood,J.H.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part2 pp.717-723, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

8. EUV interferometry of a four-mirror ring-field EUV optical system

Goldberg,K.A. ; Naulleau,P. ; Batson,P.J. ; Denham,P. ; Anderson,E.H. ; Bokor,J. ; Chapman,H.N.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.867-873, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

9. EUV engineering test stand

Tkhenor,D.A. ; Kubiak,G.D. ; Replogle,W.C. ; Klebanoff,L.E. ; Wronosky,J.B. ; Hale,L.C. ; Chapman,H.N. ; Taylor,J.S. ; Folta,J.A. ; Montcalm,C. ; Hudyma,R.M. ; Goldberg,K.A. ; Naulleau,P.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.48-69, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

10.

Conference Proceedings

10. At-wavelength characterization of DUV-radiation-induced damage in fused silica

Lee,S.H. ; Piao,F. ; Naulleau,P. ; Goldberg,K.A. ; Gldharn,W.G. ; Bokor,J.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.724-731, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

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Author: Naulleau,P.