1.

Conference Proceedings
Conference Proceedings
1. 10 Device Study of Source/Drain Extension and Halo Formation Using a Single-Wafer, High-Current Implanter
Felch, S. B. ; Food, M. A. ; Olsen, C. ; Nouri, F. ; Matsunaga, Y. ; Natsuaki, N.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.83-90,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
2.

Conference Proceedings
Conference Proceedings
2. High Performance Bipolar SOI Technology
Ikeda, T. ; Watanabe, K ; Yamaguchi, H ; Nishizawa, H. ; Tamba, N. ; Usami, M. ; Natsuaki, N.
Pub. info.: Proceedings of the Third International Symposium on Semiconductor Wafer Bonding : physics and applications.  pp.390-399,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-7