1.

Conference Proceedings
Conference Proceedings
1. Next-generation lithography mask development at the NGL Mask Center of Competency
Lercel,M.J. ; Brooks,C.J. ; Racette,K.C. ; Magg,C. ; Lawliss,M. ; Caldwell,N. ; Jeffer,R. ; Collins,K.W. ; Barrett,M. ; Nash,S.C. ; Trybendis,M.J. ; Bouchard,L.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.804-813,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Stability and stiffness characteristics of the national x-ray mask standard
Fisher,A.H. ; Sprague,M.A. ; Engelstad,R.L. ; Laird,D.L. ; Nash,S.C.
Pub. info.: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California.  pp.288-298,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3048
3.

Conference Proceedings
Conference Proceedings
3. X-ray mask defect repair optimization
Chen,Z. ; Nash,S.C. ; Krasnoperova,A.A. ; Wasik,C.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part2  pp.448-454,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676