1.

Conference Proceedings
Conference Proceedings
1. Ellipsometric scatterometry for sub-0.1-ｦﾌm CD measurements
Coulombe,S.A. ; Logofatu,P.C. ; Minhas,B.K. ; Naqvi,S.S.H. ; McNeil,J.R.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.282-293,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Scatterometric process monitor for silylation
Zaidi,S.H. ; McNeil,J.R. ; Naqvi,S.S.H.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.182-193,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050
3.

Conference Proceedings
Conference Proceedings
3. Multiparameter CD measurements using scatterometry
Raymond,C.J. ; Murnane,M.R. ; Prins,S.L. ; Naqvi,S.S.H. ; McNeil,J.R. ; Hosch,J.W.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.698-709,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
4.

Conference Proceedings
Conference Proceedings
4. Scatterometry for CD measurements of etched structures
Raymond,C.J. ; Naqvi,S.S.H. ; McNeil,J.R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.720-728,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
5.

Conference Proceedings
Conference Proceedings
5. Toward sub-0.1-ｦﾌm CD measurements using scatterometry
Minhas,B.K. ; Prins,S.L. ; Naqvi,S.S.H. ; McNeil,J.R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.729-739,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
6.

Conference Proceedings
Conference Proceedings
6. Scatterometric sensor for PEB process control
Prins,S.L. ; McNeil,J.R. ; Naqvi,S.S.H. ; Hosch,J.W.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.710-719,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
7.

Conference Proceedings
Conference Proceedings
7. Optical diffraction tomography for latent image metrology
Hatab,Z.R. ; Ahmed,N. ; Naqvi,S.S.H. ; McNeil,J.R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.515-524,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050
8.

Conference Proceedings
Conference Proceedings
8. Resist and etched line profile characterization using scatterometry
Raymond,C.J. ; Naqvi,S.S.H. ; McNeil,J.R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.476-486,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050