1.

Conference Proceedings
Conference Proceedings
1. ICP (inductively coupled plasma) dry etch of DUV MoSi HTPSM
Lee, K. Y. ; Kim, L. J. ; Nam, K. -H. ; Park, K. T. ; Ku, Y. M. ; Ku, S. S. ; Hur, I. B.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.158-165,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
2.

Conference Proceedings
Conference Proceedings
2. Implementation of chemically amplified resist on mask technology below 0.6-μm feature using high-acceleration voltage e-beam system
Lee, I. -H. ; Nam, K. -H. ; Yeon, K. -M. ; Park, K. -T. ; Koo, S. -S. ; Koo, Y. -M. ; Baik, K. -H.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.53-61,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748