1.

Conference Proceedings
Conference Proceedings
1. Influence of aberration on performance during use of resolution enhancement technology
Tsujita,K. ; Sakai,J. ; Nakae,A. ; Nakao,S. ; Wakamiya,W.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.855-867,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Proposal for pattern layout rule in application of alternating phase-shift mask
Nakae,A. ; Nakao,S. ; Matsui,Y.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.362-374,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
3.

Conference Proceedings
Conference Proceedings
3. Extension of KrF lithography to sub-50-nm pattern formation
Nakao,S. ; Itoh,J. ; Nakae,A. ; Kanai,I. ; Saitoh,T. ; Matsubara,H. ; Tsujita,K. ; Arimoto,I. ; Wakamiya,W.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.358-365,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. 0.32-ｦﾌm pitch random line pattern formation by dense dummy pattern and double exposure in KrF wavelength
Nakao,S. ; Tsujita,K. ; Arimoto,I. ; Wakamiya,W.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1123-1133,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
5.

Conference Proceedings
Conference Proceedings
5. Basic imaging characteristics of phase-edge lithography and impact of lens aberration on these characteristics
Nakao,S. ; Kanai,I. ; Tsujita,K. ; Arimoto,I. ; Wakamiya,W.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1287-1298,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
6.

Conference Proceedings
Conference Proceedings
6. Fast and accurate optical proximity correction based on aerial image simulation
Hanawa,T. ; Kamon,K. ; Nakae,A. ; Nakao,S. ; Moriizumi,K.
Pub. info.: Optical Microlithography IX.  Part2  pp.640-650,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
7.

Conference Proceedings
Conference Proceedings
7. Random pattern formation by attenuated non-phase-shift assist pattern mask
Nakao,S. ; Tokui,A. ; Tsujita,K. ; Arimoto,I. ; Wakamiya,W.
Pub. info.: Optical Microlithography XIV.  4346  pp.778-786,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
8.

Conference Proceedings
Conference Proceedings
8. Innovative imaging of ultrafine line without using any strong RET
Nakao,S. ; Narimatsu,K. ; Miyagi,T. ; Ogawa,S. ; Tamada,N. ; Nakae,A. ; Tokui,A. ; Tsujita,K. ; Arimoto,I. ; Wakamiya,W.
Pub. info.: Optical Microlithography XIV.  4346  pp.503-514,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
9.

Conference Proceedings
Conference Proceedings
9. Reduction of mask-error effect utilizing pupil filter in alternative phase-shift lithography
Nakao,S. ; Nakae,A. ; Tsujita,K. ; Matsui,Y.
Pub. info.: Optical Microlithography X.  pp.77-84,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051