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11 results

Conference Proceedings

1. PEAK-TO-PEAK VOLTAGE (Vp-p) ON Rf POWERED-ELECTRODE AND SENSITIVITY OF AMORPHOUSE SILICON (A-Si) PHOTORECEPTOR

Yamazaki, T. ; Kobayashi, N. ; Takahashii, S. ; Nakanishi, T.

Pub. info.:	Amorphous silicon technology, 1990 : symposium held April 17-20, 1990, San Francisco, California, U.S.A.. pp.435-440, 1990. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	192

Conference Proceedings

2. Surface Wave Plasma Driven by Ring Dielectric Line for Large Diameter Wafer Processing

Nakanishi, T. ; Taguchi, M. ; Mitsuhira, N. ; Matsumoto, N. ; Ozaki, S. ; Komachi, K. ; Okumura, N.

Pub. info.:	Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium. pp.13-17, 1999. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	99-30

Conference Proceedings

3. Pulsed Electrodeposition of Soft Magnetic CoNiFe Thin Films

Nakanishi, T. ; Ozaki, M. ; Nam, H.-S. ; Yokoshima, T. ; Osaka, T.

Pub. info.:	Magnetic Materials, Processes, and Devices VI, Applications to Storage and Microelectromechanical Systems (MEMS) : proceedings of the International Symposium. pp.176-184, 2000. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-29

Conference Proceedings

4. Fabrication of High-B, Soft Magnetic Thin Films by an Electrodeposition Technique for Next-Generation Magnetic Recording Field

Osaka, T. ; Yokoshima, T. ; Nakanishi, T.

Pub. info.:	Magnetic Materials, Processes, and Devices VI, Applications to Storage and Microelectromechanical Systems (MEMS) : proceedings of the International Symposium. pp.167-175, 2000. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-29

Conference Proceedings

5. Preparation and Characterization of Electrodeposited High-Bs CoNiFe Thin Films with High Resistivity and Improvement of Their Corrosion Resistance

Kaseda, M. ; Yamada, M. ; Nakanishi, T. ; Osaka, T.

Pub. info.:	Electrochemical technology applications in electronics : proceedings of the third international symposium. pp.263-272, 1999. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	99-34

Conference Proceedings

6. DEPOSITION KINETICS OF a-Si:H AND a-SiC:H FOR FABRICATION OF a-Si/a-SiC DOUBLE-LAYERED PHOTORECEPTOR

Nakanishi, T. ; Marukawa, Y. ; Takahashi, S. ; Yamazaki, T. ; Moriguchi, H.

Pub. info.:	Amorphous silicon technology : symposium held April 5-8, 1988, Reno, Nevada, U.S.A.. pp.55-60, 1988. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	118

Conference Proceedings

7. Nitrogen Profile Engineering for Tunnel Oxynitrides

Sugizaki, T. ; Tada, Y. ; Hikazutani, K-I. ; Nakanishi, T. ; Takasaki, K.

Pub. info.:	Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.207-, 1999. Warrendale, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	567

Conference Proceedings

8. Ultrathin Oxides by UV/Ozone Pretreatment Cleaning and Ozone Oxidation

Nakanishi, T. ; Ohkubo, S. ; Tamura, Y. ; Sugino, R. ; Awaji, N. ; Takasaki, K.

Pub. info.:	The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface. pp.316-328, 1996. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	96-1

Conference Proceedings

9. Impedance of Electrode-Oxide Melts Containing Iron Oxide

Yokokawa, T. ; Nakanishi, T.

Pub. info.:	Proceedings of the Ninth International Symposium on Molten Salts. pp.350-356, 1994. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1994-13

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Conference Proceedings

10. Effect of Carbon Inclusion on Properties of Electrodeposited CoNiFeMo Thin Films

Yokoshima, T. ; Kawashima, A. ; Nakanishi, T. ; Osaka, T. ; Saito, M. ; Ohashi, K.

Pub. info.:	Magnetic materials, processes, and devices VII and electrodeposition of alloys : proceedings of the International Symposium. pp.365-375, 2002. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-27

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Author: Nakanishi, T.