Stability of Advanced Photoresist Systems for Sub-0.25 Micron Lithography during Reactive Ion Etch Processes
- Author(s):
- Publication title:
- Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 99-30
- Pub. Year:
- 1999
- Page(from):
- 322
- Page(to):
- 327
- Pages:
- 6
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772532 [1566772532]
- Language:
- English
- Call no.:
- E23400/99-30
- Type:
- Conference Proceedings
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