1.

Conference Proceedings
Conference Proceedings
1. OPC technology road map to 0.14-ｦﾌm design rules
Chen,J.F. ; Laidig,L. ; Wampler,K.E. ; Caldwell,R.F. ; Naderi,A.R. ; Van Den Broeke,D.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.382-396,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236
2.

Conference Proceedings
Conference Proceedings
2. Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography
Petersen,J.S. ; Socha,R.J. ; Naderi,A.R. ; Baker,C.A. ; Rizvi,S.A. ; BanDenBroeke,D. ; Kachwala,N. ; Chen,F. ; Laiding,S. ; Wampler,K.E. ; Caldwell,R.F. ; Takeuchi,S. ; Yamada,Y. ; Senoh,T. ; McCallum,M.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.503-520,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412