1.

Conference Proceedings
Conference Proceedings
1. Etch characteristics of Ti in C12/N2 and TiN in Cl2/N2/BCl3 plasmas by response surface methodology
Muthukrishnan,N.M. ; Amberiadis,K. ; Elshabini-Riad,A.
Pub. info.: Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV.  pp.165-174,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3507
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of pad life in chemical mechanical polishing process using statistical metrology
Muthukrishnan,N.M. ; Prasad,S. ; Stine,B.E. ; Loh,W. ; Nagahara,R. ; Chung,J.E. ; Boning,D.S.
Pub. info.: Microelectronic Manufacturing Yield, Reliability, and Failure Analysis III.  pp.70-79,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3216