1.

Conference Proceedings
Conference Proceedings
1. HIGH RESOLUTION UHV ELECTRON MICROSCOPY ON SURFACES AND HETEROEPITAXY
Takayanagi, K. ; Tanishiro, Y. ; Murooka, K. ; Mitome, M.
Pub. info.: High resolution microscopy of materials : symposium held November 29-December 1, 1988, Boston, Massachusetts, U.S.A..  pp.59-66,  1989.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 139
2.

Technical Paper
Technical Paper
2. A Study Regarding Effects of Proton Exchange Membrane Fuel Cell Poisoning Due to Impurities on Fuel Cell Performance.
Narusawa, K. ; Myong, K. ; Murooka, K. ; Kamiya, Y.
Pub. info.: 2007 SAE world congress : technical paper.  2007.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2007
3.

Technical Paper
Technical Paper
3. Hydrogen Concentration Distribution in Simulated Spaces for a Hydrogen System Installed in a Large Bus in Case of Hydrogen Leakage.
Matsumura, H. ; Murooka, K. ; Matsushima, K. ; Taniguchi, T.
Pub. info.: 2008 SAE world congress : technical paper.  2008.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2008
4.

Conference Proceedings
Conference Proceedings
4. Solution for 100-nm: EBM-4000
Hattori, Y. ; Hattori, K. ; Murooka, K. ; Abe, T. ; Yasuda, S. ; Uno, T. ; Murakami, E. ; Nakayamada, N. ; Shimomura, N. ; Yamashita, T. ; Yamada, N. ; Sakai, A. ; Honda, H. ; Shimoyama, T. ; Nakaso, K. ; Inoue, H. ; Onimaru, Y. ; Makiyama, K. ; Ogawa, Y. ; Takigawa, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.697-704,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
5.

Conference Proceedings
Conference Proceedings
5. X-ray phase-shift mask for proximity x-ray lithography with synchrotron radiation
Ezaki, M. ; Murooka, K.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.462-471,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748