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11 results

Conference Proceedings

1. Silicon Oxynitride Gate-Dielectric Made by ECR Plasma Oxynitridation

Manera, G. A. ; Diniz, J. A. ; Moshkalyov, S. A. ; Lujan, G. S. ; Doi, I. ; Swart, J. W.

Pub. info.:	Microelectronics technology and devices : SBMICRO 2004 : proceedings of the nineteenth international symposium. pp.253-258, 2004. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2004-03

Conference Proceedings

2. Study of Carbon Nanotubes Growth by Atmospheric Pressure Chemical Vapor Deposition

Verissimo, C. ; Moshkalyov, S. A. ; Ramos, A. C. S. ; Goncalves, J. L. ; Leon, J. ; Swart, J. W.

Pub. info.:	Microelectronics technology and devices : SBMICRO 2004 : proceedings of the nineteenth international symposium. pp.163-168, 2004. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2004-03

Conference Proceedings

3. Selective Etching of Polycrystalline Silicon in a Hexode Type Plasma Etcher

Vieira, R. ; Martarello, V. ; Moshkalyov, S. A. ; Diniz, J. A. ; Swart, J. W.

Pub. info.:	Microelectronics technology and devices : SBMICRO 2004 : proceedings of the nineteenth international symposium. pp.363-368, 2004. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2004-03

Conference Proceedings

4. Use of a Langmuir Probe for ECR Plasma Characterization

Daltrini, A. M. ; Moshkalyov, S. A. ; Ramos, A. C. S. ; Swart, J. W.

Pub. info.:	Microelectronics technology and devices : SBMICRO 2004 : proceedings of the nineteenth international symposium. pp.375-380, 2004. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2004-03

Conference Proceedings

5. Deep Dry Etching of Silicon Using Bosch Type Process

Guidini, V. O. ; Moshkalyov, S. A. ; Tatsch, P. J.

Pub. info.:	Microelectronics technology and devices : SBMICRO 2004 : proceedings of the nineteenth international symposium. pp.381-386, 2004. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2004-03

Conference Proceedings

6. Reactive Ion Etching of SiGe Using Halogen-Based Plasmas

Reyes-Betanzo, C. ; Moshkalyov, S. A.

Pub. info.:	Microelectronics technology and devices : SBMICRO 2004 : proceedings of the nineteenth international symposium. pp.345-350, 2004. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2004-03

Conference Proceedings

7. Control of Micron and Submicron Feature Dimensions in 2um Resolution Photolithographic System for MOS and MEMS Applications

Fioravante, N. P. Jr. ; Manera, L. T. ; Moshkalyov, S. A. ; Diniz, J. A. ; Tatsch, P. J. ; Grados, H. R. J. ; Doi, I. ; Swart, J. W.

Pub. info.:	Microelectronics technology and devices : SBMICRO 2004 : proceedings of the nineteenth international symposium. pp.369-374, 2004. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2004-03

Conference Proceedings

8. Silicon Oxide Sacrificial Layer for MEMS Applications

Biasotto, C. ; Boscoli, F. A. ; Teixeira, R. C. ; Ramos, A. C. S. ; Diniz, J. A. ; Daltrini, A. M. ; Moshkalyov, S. A. ; Doi, I.

Pub. info.:	Microelectronics technology and devices : SBMICRO 2005 : proceedings of the twentieth international symposium. pp.389-397, 2005. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-08

Conference Proceedings

9. Langmuir Probe and Optical Emission Spectroscopy Study of an Inductively Coupled Plasma Source

Daltrini, A. M. ; Monteiro, M. J. R. ; Kostryukov, A. ; Moshkalyov, S. A. ; Machida, M. ; Besseler, E.

Pub. info.:	Microelectronics technology and devices : SBMICRO 2005 : proceedings of the twentieth international symposium. pp.245-253, 2005. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-08

10.

Conference Proceedings

10. Growth of Carbon Nanostructures by Thermal Chemical Vapor Deposition via Metal Catalysis

Verissimo, C. ; Moshkalyov, S. A. ; Ramos, A. C. S. ; Goncalves, J. L. ; Swart, J. W.

Pub. info.:	Microelectronics technology and devices : SBMICRO 2005 : proceedings of the twentieth international symposium. pp.311-320, 2005. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-08

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