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30 results

Conference Proceedings

1. First-Principles Calculations of Metal/Oxide Interfaces: Effects of Interface Stoichiometry

Kohyama, M. ; Tanaka, S. ; Okazaki, K. ; Yang, R. ; Morikawa, Y.

Pub. info.:	New frontiers of processing and engineering in advanced materials : proceedings of the International Conference on New Frontiers of Process Scinence and Engineering in Advanced Materials : The 14th Iketani Conference, November, 24-26, 2004, held in Kyoto, Japan. pp.27-32, 2005. Zuerich, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	502

Conference Proceedings

2. Supported alkali salt catalysts active for the guerbet reaction between methanol and ethanol

Gotoh, K. ; Nakamura, S. ; Mori, T. ; Morikawa, Y.

Pub. info.:	12th International Congress on Catalysis : proceedings of the 12th ICC, Granada, Spain, July 9-14, 2000. pp.2669-, 2000. Amsterdam. Elsevier
Title of ser.:	Studies in surface science and catalysis
Ser. no.:	130

Conference Proceedings

3. Formation and its characteristics of PLZT layered film structure for transducers

Ichiki, M. ; Kobayashi, T. ; Morikawa, Y. ; Mabune, Y. ; Nakada, T. ; Nonaka, K. ; Endo, C. ; Maeda, R.

Pub. info.:	Device and process technologies for MEMS, microelectronics, and photonics III : 10-12 December 2003, Perth, Australia. pp.400-407, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5276

Conference Proceedings

4. Methanol-Based Synthetic Reactions over Solid-Base Catalysts

Ueda, W. ; Ohowa, H. ; Iwasaki, K. ; Kuwabara, T. ; Ohshida, T. ; Morikawa, Y.

Pub. info.:	Acid-base catalysis II : proceedings of the International Symposium on Acid-Base Catalysis II, Sapporo, December 2-4, 1993. pp.35-, 1994. Tokyo. Elsevier
Title of ser.:	Studies in surface science and catalysis
Ser. no.:	90

Conference Proceedings

5. Hydrodechlorination of CCl2F-CF3 (CFC-114α) over silica-supported noble metal catalysts

Mori, T. ; Morikawa, Y.

Pub. info.:	12th International Congress on Catalysis : proceedings of the 12th ICC, Granada, Spain, July 9-14, 2000. pp.1985-, 2000. Amsterdam. Elsevier
Title of ser.:	Studies in surface science and catalysis
Ser. no.:	130

Conference Proceedings

6. AB INITIO MOLECULAR DYNAMICS STUDY OF Al, Ga AND Si ADSORPTION ON THE Si(001) SURFACE

Yamasaki, T. ; Ikeda, M. ; Morikawa, Y. ; Terakura, K.

Pub. info.:	Interface control of electrical, chemical, and mechanical properties : symposium held November 29-December 3, 1993, Boston, Massachusetts, U.S.A.. pp.257-, 1994. Pittsburgh. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	318

Conference Proceedings

7. Direct synthesis of propionamide and propiononitrile from ethylene carbon monoxide, and ammonia using supported Ru catalyst

Zhao, S. -P. ; Sassa, S. -I. ; Inoue, H. ; Yamakazi, M. ; Watanabe, H. ; Mori, T. ; Morikawa, Y.

Pub. info.:	12th International Congress on Catalysis : proceedings of the 12th ICC, Granada, Spain, July 9-14, 2000. pp.2285-, 2000. Amsterdam. Elsevier
Title of ser.:	Studies in surface science and catalysis
Ser. no.:	130

Conference Proceedings

8. Optimization of nanomachining repair condition for ArF lithography

Amano, T. ; Nishiguchi, M. ; Hashimoto, H. ; Morikawa, Y. ; Hayashi, N. ; White, R. ; Bozak, R. ; Terrill, L.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.538-545, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

9. 45-32-nm node photomask technology with water immersion lithography [6349-134]

Adachi, T. ; Inazuki, Y. ; Sutou, T. ; Morikawa, Y. ; Toyama, N. ; Mohri, H. ; Hayashi, N.

Pub. info.:	Photomask Technology 2006. pp.63493J-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

10.

Conference Proceedings

10. In-field CD uniformity control by altering transmission distribution of the photomask using ultra fast pulsed laser technology [6283-29]

Morikawa, Y. ; Sutou, T. ; Inazuki, Y. ; Adachi, T. ; Yoshida, Y. ; Kojima, K. ; Sasaki, S. ; Mohri, H. ; Hayashi, N. ; Dmitriev, V. ; Oshemkov, S. ; Zait, E. ; Ben-Zvi, G.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831Y-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

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