1.

Conference Proceedings
Conference Proceedings
1. Estimation of optical proximity effect caused by mask fabrication error
Kamon,K. ; Hanawa,T. ; Moriizumi,K.
Pub. info.: Optical Microlithography X.  pp.781-789,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
2.

Conference Proceedings
Conference Proceedings
2. Fast and accurate optical proximity correction based on aerial image simulation
Hanawa,T. ; Kamon,K. ; Nakae,A. ; Nakao,S. ; Moriizumi,K.
Pub. info.: Optical Microlithography IX.  Part2  pp.640-650,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
3.

Conference Proceedings
Conference Proceedings
3. High-speed electron beam data verification system using high-performance neural network accelerator board
Tamura,T. ; Bouchon,D. ; Fournier,P. ; Moriizumi,K. ; Tanaka,K. ; Kyuma,K.
Pub. info.: Machine Vision Applications, Architectures, and Systems Integration V.  pp.14-19,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2908
4.

Conference Proceedings
Conference Proceedings
4. New figure-fracturing algorithm for high-quality variable-shaped e-beam exposure data generation
Nakao,H. ; Moriizumi,K. ; Kamiyama,K. ; Terai,M. ; Miwa,H.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.398-409,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793