4｡ﾟreticles with 3% linewidth control for the development of 0.18-ｦﾌm lithography

4｡ﾟreticles with 3% linewidth control for the development of 0.18-ｦﾌm lithography

Author(s):

Publication title:

16th Annual BACUS Symposium on Photomask Technology and Management

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2884

Pub. Year:

1996

Page(from):

290

Page(to):

301

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819422828 [0819422827]

Language:

English

Call no.:

P63600/2884

Type:

Conference Proceedings

Details

TDL ID:	ZA00018423
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual Symposium on Photomask Technology and Management
Conf. info. (Number):	1996 : 16th
Conf. info. (Venue):	Redwood City, California, USA
Conf. info. (Date):	1996.09.18-1996.09.20

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