1.

Conference Proceedings
Conference Proceedings
1. Characteristics of Ge-based ARL for DUV lithography
Kim,Y.B. ; Kim,D.W. ; Kang,H. ; Moon,J.T. ; Lee,M.Y.
Pub. info.: Optical Microlithography X.  pp.154-163,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
2.

Conference Proceedings
Conference Proceedings
2. Lithography process design for 4-Gb DRAM of 0.31 k1 with KrF
Park,J. ; Yeo,G. ; Kim,I. ; Kim,B.-S. ; Lee,J. ; Cho,H. ; Moon,J.T.
Pub. info.: Optical Microlithography XIV.  4346  pp.205-213,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
3.

Conference Proceedings
Conference Proceedings
3. Carbon antireflective coating (ARC) technology for both KrF and ArF lithography
Kim,Y. ; Lee,J. ; Cho,H. ; Moon,J.T.
Pub. info.: Optical Microlithography XIV.  4346  pp.994-1002,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346