1.

Conference Proceedings
Conference Proceedings
1. High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow
Joo, H.S. ; Seo, D.C. ; Kim, C.M. ; Lim, Y.T. ; Cho, S.D. ; Lee, J.B. ; Song, J.Y. ; Kim, K.M. ; Park, J.H. ; Jung, J.C. ; Shin, K.S. ; Bok, C.K. ; Moon, S.C.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.126-133,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
2.

Conference Proceedings
Conference Proceedings
2. Quencher gradient resist process for low-k process
Jung, J.C. ; Lee, S.K. ; Lee, W.W. ; Bok, C.K. ; Moon, S.C. ; Shin, K.S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.63-70,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
3.

Conference Proceedings
Conference Proceedings
3. High-etch-rate ArF BARC composed of polyester
Hwang, Y.S. ; Jung, J.C. ; Ban, K.D. ; Park, S. ; Bok, C.K. ; Moon, S.C. ; Shin, K.S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.718-723,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
4.

Conference Proceedings
Conference Proceedings
4. Novel rinse process for reducing pattern collapse in 0.30-k1 ArF lithography
Lee, G. ; Hwang, Y.S. ; Ban, K.D. ; Bok, C.K. ; Moon, S.C. ; Shin, K.S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.813-818,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
5.

Conference Proceedings
Conference Proceedings
5. Investigation of the effect of resist components and process condition on photochemical efficiency of ArF photoresist
Kim, J.-W. ; Son, E.-K. ; Lee, S.-H. ; Kim, D. ; Kim, J. ; Lee, G. ; Jung, J.C. ; Bok, C.K. ; Moon, S.C. ; Shin, K.S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.599-607,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376