1.

Conference Proceedings
Conference Proceedings
1. Organosiloxane based bottom antireflective coatings for 193nm lithography
Son, E.-K. ; Kim, J.-W. ; Lee, S.-H. ; Park, C.-S. ; Lee, J.-W. ; Kim, J. ; Lee, G.-S. ; Lee, S.-K. ; Ban, K.-D. ; Jung, J.-C. ; Bok, C. K. ; Moon, S.-C.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.449-458,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. Era of double exposure in 7O nm node DRAM cell
Lim, C.-M. ; Eom, T.-S. ; Kim, S.-M. ; Bok, C. ; Ma, W.-K. ; Park, G.-D. ; Moon, S.-C. ; Kim, J.-W.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.368-376,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM
Eom, T.-S. ; Lim, C.-M. ; Kim, S.-M. ; Kim, H.-B. ; Oh, S.-Y. ; Ma, W.-K. ; Moon, S.-C. ; Shin, K.S.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1310-1320,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Feasibility studies of ArF chromeless mask (CLM) for sub-80-nm era
Eom, T.-S. ; Lim, C.-M. ; Sung, M.G. ; Moon, S.-C. ; Shin, K.S.
Pub. info.: Optical Microlithography XVII.  pp.1287-1296,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
5.

Conference Proceedings
Conference Proceedings
5. Diffraction analysis of customized illumination technique
Lim, C.-M. ; Kim, S.-M. ; Eom, T.-S. ; Moon, S.-C. ; Shin, K.S.
Pub. info.: Optical Microlithography XVII.  pp.1297-1304,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
6.

Conference Proceedings
Conference Proceedings
6. New approach for pattern collapse problem by increasing contact area at sub-100nm patterning
Lee, S.-K. ; Jung, J.C. ; Lee, M.S. ; Lee, S.K. ; Kim, S.Y. ; Hwang, Y.-S. ; Bok, C.K. ; Moon, S.-C. ; Shin, K.S. ; Kim, S.-J.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.166-174,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
7.

Conference Proceedings
Conference Proceedings
7. Rinse liquid to improve pattern collapse behavior
Lee, G. ; Lee, S.-K. ; Hwang, Y.-S. ; Jung, J.-C. ; Bok, C. ; Moon, S.-C. ; Shin, K.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1416-1424,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
8.

Conference Proceedings
Conference Proceedings
8. Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology
Joo, H.-S. ; Seo, D.C. ; Kim, C.M. ; Lim, Y.T. ; Cho, S.D. ; Lee, J.B. ; Jeon, H.P. ; Park, J.H. ; Jung, J.C. ; Shin, K.S. ; Bok, C.K. ; Moon, S.-C.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.725-732,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
9.

Conference Proceedings
Conference Proceedings
9. Double exposure to reduce overall line-width variation of 80-nm DRAM gate
Ma, W.-K. ; Lim, C.-M. ; Oh, S.-Y. ; Nam, B.-H. ; Moon, S.-C. ; Shin, K.S.
Pub. info.: Optical Microlithography XVII.  pp.939-946,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377