Nagamura, Y. ; Momose, S. ; Imai, A. ; Hosono, K. ; Morikawa, Y. ; Kojima, K. ; Mohri, H. ; Dai Nippon Printing Co., Ltd. (Japan)
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XII. pp.977-987, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering