1.

Conference Proceedings
Conference Proceedings
1. A Comparative Study of Scaling Properties of MOS Transistors in CHE and CHISEL Injection Regime
Mohapatra, Nihar R. ; Mahapatra, Souvik ; Ramgopal Rao, V.
Pub. info.: Proceedings of the Eleventh International Workshop on the Physics of Semiconductor Devices : (December 11-15, 2001).  VOL-1  pp.686-689,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4746
2.

Conference Proceedings
Conference Proceedings
2. Effective Dielectric Thickness Scaling For It High-K Gate Dielectric MOSFETs
Bhuwalka, Krishna Kumar ; Mohapatra, Nihar R. ; Narendra, Siva G. ; Rao, V. Ramgopal
Pub. info.: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.215-220,  2002.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 716
3.

Conference Proceedings
Conference Proceedings
3. Effect Of Technology Scaling On Mos Transistors With High-K Gate Dielectrics
Mohapatra, Nihar R. ; Desai, Madhav P. ; Narendra, Siva G. ; Rao, V. Ramgopal
Pub. info.: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.133-138,  2002.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 716