1.

Conference Proceedings
Conference Proceedings
1. Hyper-numerical aperture imaging challenges for 193 nm
Mizoguchi, H. ; Inoue, T. ; Fujimoto, J. ; Yamazaki, T. ; Suzuki, T. ; Matsunaga, T. ; Sakanishi, S. ; Kaminishi, M. ; Watanabe, Y. ; Ohta, T. ; Nakane, M. ; Moriya, M. ; Nakaike, T. ; Shinbori, M. ; Yoshino, M. ; Kawasuji, T. ; Nogawa, H. ; Ito, T. ; Umeda, H. ; Tanaka, S. ; Taniguchi, H. ; Sasaki, Y. ; Kinoshita, J. ; Abe, T. ; Tanaka, H. ; Hayashi, H. ; Miyao, K. ; Niwano, M. ; Kurosu, A. ; Yashiro, M. ; Nagano, H. ; Matsui, N. ; Mimura, T. ; Kakizaki, K. ; Goto, M.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.69-79,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography
Hori, T. ; Yabu, T. ; Ishihara, T. ; Watanabe, T. ; Wakabayashi, O. ; Sumitani, A. ; Kakizaki, K. ; Mizoguchi, H.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1285-1292,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. Design of high-average-power clean EUV light source based on laser-produced Xenon plasma
Endo, A. ; Abe, T. ; Suganuma, T. ; Imai, Y. ; Someya, H. ; Hoshino, H. ; Masaki, N. ; Soumagne, G. ; Komori, H. ; Takabayashi, Y. ; Mizoguchi, H.
Pub. info.: Laser-generated and other laboratory X-ray and EUV sources, optics, and applications : 4-6 August 2003, San Diego, California, USA.  pp.256-262,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5196
4.

Conference Proceedings
Conference Proceedings
4. Development of C02 laser produced Xe plasma EUV light source for microlithography [6151-27]
Mizoguchi, H. ; Endo, A. ; Arigo, T. ; Miura, T. ; Hoshino, H. ; Ueno, Y. ; Nakano, M. ; Komori, H. ; Sumitani, A. ; Abe, T. ; Suganuma, T. ; Soumagne, G. ; Someya, H. ; Takabayashi, Y. ; Toyoda, K.
Pub. info.: Emerging Lithographic Technologies X.  pp.61510S-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
5.

Conference Proceedings
Conference Proceedings
5. High power injection lock 6kHz 60W laser for ArF dry/wet lithography [6154-78]
Mizoguchi, H. ; Inoue, T. ; Fujimoto, J. ; Suzuki, T. ; Matsunaga, T. ; Sakanish, S. ; Kaminishi, M. ; Watanabe, Y. ; Nakaike, T. ; Shinbori, M. ; Yoshino, M ; Kawasuji, T ; Nogawa, H ; Umeda, H ; Taniguchi, H ; Sasaki, Y ; Kinoshita, J ; Abe T ; Tanaka, H ; Hayashi, H ; Miyao, K ; Niwano, M ; Kurosu, A ; Yashiro, M ; Nagano, H ; Igarashi, T ; Mimura, T ; Kakizaki, K
Pub. info.: Optical Microlithography XIX.  pp.615425-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
6.

Conference Proceedings
Conference Proceedings
6. Development of a 5-kHz ultra-line-narrowed F2 laser for dioptric projection systems
Ariga, T. ; Watanabe, H. ; Kumazaki, T. ; Kitatochi, N. ; Sasano, K. ; Ueno, Y. ; Konishi, M. ; Suganuma, T. ; Nakano, M. ; Yamashita, T. ; Nishisaka, T. ; Nohdomi, R. ; Hotta, K. ; Mizoguchi, H. ; Nakao, K.
Pub. info.: Optical Microlithography XV.  Part One  pp.652-659,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
7.

Conference Proceedings
Conference Proceedings
7. Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation
Saito, T. ; Suzuki, T. ; Yoshino, M. ; Wakabayashi, O. ; Matsunaga, T. ; Fujimoto, J. ; Kakizaki, K. ; Yamazaki, T. ; Inoue, T. ; Terashima, K. ; Enami, T. ; Inoue, H. ; Sumitani, A. ; Tomaru, H. ; Mizoguchi, H.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1704-1711,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
8.

Conference Proceedings
Conference Proceedings
8. Development of liquid-jet laser-produced plasma light source for EUV lithography
Abe, T. ; Suganuma, T. ; Imai, Y. ; Sugimoto, Y. ; Someya, H. ; Hoshino, H. ; Soumagne, G. ; Komori, H. ; Mizoguchi, H. ; Endo, A. ; Toyoda, K.
Pub. info.: Emerging Lithographic Technologies VII.  2  pp.776-783,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
9.

Conference Proceedings
Conference Proceedings
9. Spectral metrologies for ultra-line-narrowed F2 laser
Nakaike, T. ; Wakabayashi, O. ; Suzuki, T. ; Mizoguchi, H. ; Nakao, K. ; Nohdomi, R. ; Ariga, T. ; Kitatochi, N. ; Suganuma, T. ; Kumazaki, T. ; Hotta, K. ; Yoshioka, M.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1714-1721,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
10.

Conference Proceedings
Conference Proceedings
10. Beam quality of a new-type MOPO laser system for VUV laser lithography
Wakabayashi, O. ; Ariga, T. ; Kumazaki, T. ; Sasano, K. ; Watanabe, T. ; Yabu, T. ; Hori, T. ; Kakizaki, K. ; Sumitani, A. ; Mizoguchi, H.
Pub. info.: Optical Microlithography XVII.  pp.1772-1780,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377