1.

Conference Proceedings
Conference Proceedings
1. Resist metrology for lithography simulation,part 2:development parameter measurements
Sekiguchi,A. ; Mack,C.A. ; Minami,Y. ; Matsuzawa,T.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.49-63,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
2.

Conference Proceedings
Conference Proceedings
2. Quality evaluation model of coded stereoscopic color image
Horita,Y. ; Kawai,Y. ; Minami,Y. ; Mural,T.
Pub. info.: Visual Communications and Image Processing 2000.  Part1  pp.389-398,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4067
3.

Conference Proceedings
Conference Proceedings
3. Japanese activity on laser applications in space
Tsujikawa,Y. ; Imasaki,K. ; Niino,M. ; Minami,Y. ; Hatsuda,Y.
Pub. info.: High-Power Laser Ablation II.  pp.54-64,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3885
4.

Conference Proceedings
Conference Proceedings
4. Resist metrology for lithography simulation,part I:exposure parameter measurements
Mack,C.A. ; Matsuzawa,T. ; Sekiguchi,A. ; Minami,Y.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.34-48,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725