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17 results

Conference Proceedings

1. SURFACE CHARACTERISATION OF Si AFTER HF TREATMENTS AND ITS INFLUENCE ON THE DIELECTRIC BREAKDOWN OF THERMAL OXIDES

Verhaverbeke, S. ; Alay, J. ; Mertens, P. ; Meuris, M. ; Heyns, M. ; Vandervorst, W. ; Murrell, M. ; Sofield, C.

Pub. info.:	Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.. pp.391-398, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	259

Conference Proceedings

2. INTRODUCTORY REMARKS -- PROCESS MODELING

Mertens, P. ; Richter, H.

Pub. info.:	Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.455-457, 2002. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-2

Conference Proceedings

3. EVALUATION OF MEGASONIC CLEANING SYSTEMS FOR PARTICLE REMOVAL EFFICIENCY AND DAMAGING

Vereecke, G. ; Holsteyns, F. ; Veltens, J. ; Lux, M. ; Amauts, S. ; Kenis, K. ; Vos, R. ; Mertens, P. ; Heyns, M.

Pub. info.:	Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.145-152, 2003. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-26

Conference Proceedings

4. MECHANISMS OF PARTICLE REMOVAL DURING BRUSH SCRUBBER CLEANING

Xu, K. ; Vos, R. ; Vereecke, G. ; Mertens, P. ; Heyns, M. ; Vinckier, C. ; Fransaer, J.

Pub. info.:	Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.137-144, 2003. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-26

Conference Proceedings

5. CORROSION OF ALUMINUM ALLOYS DURING DRYING OF METALLIZED WAFERS

Vos, R. ; Meuris, M. ; Mertens, P. ; Heyns, M. ; Hatcher, Z.

Pub. info.:	Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.569-578, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-35

Conference Proceedings

6. Advanced Wet Cleaning Technology For Highly Reliable Thin Oxides

Verhaverbeke, S. ; Meuris, M. ; Mertens, P. ; Schmidt, H. ; Heyns, M.M. ; Philipossian, A. ; Graeff, D. ; Dillenbeck, K.

Pub. info.:	Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993. pp.199-219, 1993. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1993-13

Conference Proceedings

7. CLEANING OF METAL GATE STACKS FOR THE SUB 90 nm TECHNOLOGY NODE

Snow, J. ; Kraus, H. ; Vermeyen, K. ; Fyen, W. ; Mertens, P. ; Kovacs, F.

Pub. info.:	Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.393-399, 2003. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-26

Conference Proceedings

8. COMPARISON OF SHORT TIME ANNEALING OF IMPLANTED SILICON LAYERS WITH TUNGSTEN-HALOGEN LAMP AND MERCURY ARC LAMP SOURCES

Wouters, D. ; Avau, D. ; Mertens, P. ; Maes, H.E.

Pub. info.:	Rapid thermal processing : symposium held December 2-4, 1985, Boston, Massachusetts, U.S.A.. pp.217-224, 1985. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	52

Conference Proceedings

9. QUANTITATIVE MODELING OF H2O2 DECOMPOSITION IN SC1

Mertens, P. ; Baeyens, M. ; Moyaerts, G. ; Okorn-Schmidt, H. ; Vos, R. ; De Waele, R. ; Hatcher, Z. ; Hub, W. ; De Gendt, S. ; Knotter, M. ; Meuris, M. ; Heyns, M.

Pub. info.:	Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.176-183, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-35

10.

Conference Proceedings

10. Characterization of Advanced Semiconductor Materials by Thermal Desorption Mass Spectrometry with Atmospheric, Pressure Ionization

Carbonell, L. ; Vereecke, G. ; Van Elshocht, S. ; Caymax, M. ; Van Hove, M. ; Maex, K. ; Mertens, P.

Pub. info.:	Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.150-159, 2003. Pennington, NJ. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5133

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