1.

Conference Proceedings
Conference Proceedings
1. Mighty high-T lithography for 65-nm generation contacts
Conley, W. ; Montgomery, P.K. ; Lucas, K. ; Litt, L.C. ; Maltabes, J.G. ; Dieu, L. ; Hughes, G.P. ; Mellenthin, D.L. ; Socha, R.J. ; Fanucchi, E.L. ; Verhappen, A. ; Wampler, K.E. ; Yu, L. ; Schaefer, E. ; Cassel, S. ; Kuijten, J.P. ; Pijnenburg, W. ; Wiaux, V. ; Vandenberghe, G.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1210-1219,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Advanced 193 tri-tone EAPSM (9% to 18%) for 65-nm node
Dieu, L. ; Fanucchi, E.L. ; Hughes, G.P. ; Maltabes, J.G. ; Mellenthin, D.L. ; Conley, W. ; Litt, L.C. ; Lucas, K. ; Socha, R.J. ; Wampler, K.E. ; Verhappen, A. ; Kiuten, J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1227-1233,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889