A methodology for the characterization of topography induced immersion bubble defects
- Author(s):
Warrick, S. ( Freescale Semiconductor (France) ) Hinnen, P. ( ASML (Netherlands) ) Morton, R. ( Philips Semiconductors (France) ) Cooper, K. ( Freescale Semiconductor (France) ) Sassoulas, P.-O. ( STMicroelectronics (France) ) Depre, J. ( ASML (Netherlands) ) Navarro, R. ( ASML (Netherlands) ) van Haren, R. ( ASML (Netherlands) ) Browning, C. ( Freescale Semiconductor (France) ) Reber, D. ( Freescale Semiconductor (France) ) Megens, H. ( ASML (Nefherlands) ) - Publication title:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5754
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 154
- Page(to):
- 163
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- Language:
- English
- Call no.:
- P63600/5754
- Type:
- Conference Proceedings
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