Aberration determination in early 157-nm exposure system

Aberration determination in early 157-nm exposure system

Author(s):

Smith, B.W. ( Rochester Institute of Technology (USA) )

Conley, W. ( International SEMATECH (USA) )

Garza, C.M. ( Motorola (USA) )

Meute, J. ( International SEMATECH (USA) )

Miller, D.A. ( International SEMATECH (USA) )

Foster, J. ( ASML (USA) )

Moers, M.H. ( ASML (Netherlands) )

Cummings, K.D.

Webb, J.E. ( Corning Tropel Corp. (USA) )

Dewa, P.G.

Zerrade, A. ( DuPont Photomasks, Inc. (USA) )

McDonald, S.S.

Hughes, G.P.

Dirksen, P. ( Philips Research Labs. (Belgium) )

14 more

Publication title:

Optical Microlithography XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4691

Pub. Year:

2002

Vol.:

Part Two

Page(from):

1635

Page(to):

1643

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

Language:

English

Call no.:

P63600/4691

Type:

Conference Proceedings

Details

TDL ID:	ZA00012526
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2002 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.08

Similar Items:

1 Conference Proceedings Correction of 157-nm lens based on phase ring aberration extraction method Meute, J., Rich, G.K., Conley, W., Smith, B.W., Zavyalova, L.V., Cashmore, J.S., Ashworth, D., Webb, J.E., Rich, L. SPIE - The International Society of Optical Engineering	7 Conference Proceedings 157-nm alternating phase-shifting mask design and high-NA images Chen, Y.-T., Meute, J., Dean, K., Brooker, P.D. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH Meute, J., Rich, G.K., Hien, S., Dean, K.R., Gondran, C., Cashmore, J.S., Ashworth, D., Webb, J.E., Rich, L.R., Dewa, … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Photoresist outgassing at 157-nm exposure Hien,S., Angood,S., Ashworth,D., Basset,S., Bloomstein,T.M., Dean,K.R., Kunz,R.R., Miller,D.A., Patel,S., Rich,G.K. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Ring-test aberration determination and device lithography correlation Garza,C.M., Conley,W., Roman,B.J., Schippers,M., Foster,J., Baselmans,J., Cummings,K.D., Flagello,D.G. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Optimization of etch conditions for a silicon-containing methacrylate-based bilayer resist for 193-nm lithography Steinhausler,T., Gabor,A.H., White,D., Blakeney,A.J., Stark,D.R., Miller,D.A., Rich,G.K., Graffenberg,V.L., Dean,K.R. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Effects of airborne molecular contamination on 157-nm resists: AMC friend or foe? Meute, J.J., Rich, G., Turnquest, K., Dean, K., Patel, S., Graffenberg, V.L., Rodriguez, M.P. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Image performance and mask characterization of 157-nm alternating phase-shifting mask Chen, Y.-T., Meute, J., Dean, K.R., Stark, D.R., Schilz, C.M., Dettmann, W., Koehle, R., Schiessl, B., Degel, W. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Perfect photoresist for 157-nm imaging Conley,W., Byers,J.D., Dean,K.R., Hansen,S.G., Finders,J., Sinkwitz,S. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Polyhedral oligomeric silsesquioxane (POSS) based resist materials for 157-nm lithography Tegou, E., Bellas, V., Gogolides, E., Argitis, P., Dean, K.R., Eon, D., Cartry, G., Cardinaud, C. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Parameter extraction for 157-nm photoresists Bendik, J.J., Conley, W., Miller, D.A., Zimmerman, P., Dean, K.R., Petersen, J.S., Byers, J. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Aberration evaluation and tolerancing of 193-nm lithographic objective lenses Smith,B.W., Webb,J.E., Petersen,J.S., Meute,J. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12