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17 results

Conference Proceedings

1. Some lithographic limits of back end lithography

McCallum,M.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.290-297, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

2. Optical extension at the 193-nm wavelength

Zandbergen,P. ; McCallum,M. ; Amblard,G.R. ; Domke,W.-D. ; Smith,B .W. ; Zavyalova,L. ; Petersen,J.S.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.310-319, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

3. Manufacturability of subwavelength features using reticle and substrate enhancements

McCallum,M. ; Lucas,K.D ; Maltabes,J.G. ; Kling,M.E.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.391-402, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

4. Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node

Petersen,J.S. ; McCallum,M. ; Kachwala,N. ; Socha,R.J. ; Chen,J.F. ; Laidig,T.L. ; Smith,B.W. ; Gordon,R.L. ; Mack,C.A.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.73-89, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

5. 193-nm lithography:new challenges,new worries

McCallum,M. ; Domke,W.-D. ; Byers,J.D. ; Stark,D.R.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.59-65, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

6. Reactive ion etching of 193-nm resist candidates: current platforms and future requirements

Wallow,T.I. ; Brock,P.J. ; DiPietro,R.A. ; Allen,R.D. ; Opitz,J. ; Sooriyakumaran,R. ; Hofer,D.C. ; Meute,J. ; Byers,J.D. ; Rich,G.K. ; McCallum,M. ; Schuetze,S. ; Jayaraman,S. ; Hullihen,K. ; Vicari,R. ; Rhodes,L.F. ; Goodall,B.L. ; Shick,R.A.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.92-101, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

7. Design,reticle,and wafer OPC manufacturability for the 0.18-ｦﾌm lithography generation

Lucas,K.D. ; McCallum,M. ; Falch,B.J. ; Wood,J.L. ; Kalk,F.D. ; Henderson,R.K. ; Russell,D.R.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.118-129, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

8. Imaging contrast improvement for 160-nm line features using subresolution assist features with binary,six percent ternary attenuated phase-shift mask with process-tuned resist

Kachwala,N. ; Petersen,J.S. ; Chen,J.F. ; Canjemi,M. ; McCallum,M.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.55-67, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

9. High-transmission attenuated PSM:benefits and limitations through a validation study of 33%,20%,and 6% transmission masks

Kachwala,N. ; Petersen,J.S. ; McCallum,M.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1163-1174, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

10.

Conference Proceedings

10. Deducing aerial image behavior from AIMS data

Gordon,R.L. ; Flagello,D.G. ; McCallum,M.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.734-743, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

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Author: McCallum,M.