1.

Conference Proceedings
Conference Proceedings
1. Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms
Wallow, T. I. ; Brock, P. J. ; DiPietro, R. A. ; Allen, R. D. ; Opitz, J. ; Sooriyakumaran, R. ; Hofer, D. C. ; Mewherter, A. M. ; Cui, Y. ; Yan, W. ; Worth, G. ; Moreau, W. M. ; Meute, J. ; Byers, J. D. ; Rich, G. K. ; McCallum, M. ; Jayaraman, S. ; Vicari, R. ; Cagle, J. ; Sun, S. ; Hullihen, K. A.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.26-35,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. 193-nm single-layer process for 150-nm technology generation and below
Amblard, G. R. ; Zandbergen, P. ; McCallum, M. ; Stephen, A. ; Byers, J. D. ; Dean, K. R. ; Meute, J. ; Nelson, C. M.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.810-827,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. Development of the ASML EUV alpha demo tool
Romeo, C. ; Cantu, P. ; Henry, D. ; Takekoshi, H. ; Hirayanagi, N. ; Suzuki, K. ; McCallum, M. ; Fujita, H. ; Takikawa, T. ; Hoga, M.
Pub. info.: Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA.  pp.90-101,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5751
4.

Conference Proceedings
Conference Proceedings
4. Electrical dimension characterization of binary and alternating aperture phase-shifting masks
McCallum, M. ; Smith, S. ; Lissimore, A. ; Walton, A.J. ; Stevenson, J.T.M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.309-318,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
5.

Conference Proceedings
Conference Proceedings
5. Practical DUV lithography for the optoelectronics market
Harris, P.D. ; McCallum, M. ; Muir, D. ; Hughes, G. ; Pinkney, S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.910-917,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
6.

Conference Proceedings
Conference Proceedings
6. Effect of aberrations on defect printing and inspection
Harris, P.D. ; McCallum, M.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1480-1491,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
7.

Conference Proceedings
Conference Proceedings
7. Compensation for imaging errors in EUV lithography
Harris, P. ; McCallum, M.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.833-838,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
8.

Conference Proceedings
Conference Proceedings
8. Extension of photolithography
Kameyama, M. ; McCallum, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.451-461,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
9.

Conference Proceedings
Conference Proceedings
9. Cost-effective overlay and CD metrology on phase-shifting masks
McCallum, M. ; Smith, S. ; Hourd, A. ; Walton, A. J. ; Stevenson, J. T. M.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.596-603,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
10.

Conference Proceedings
Conference Proceedings
10. Optical inspection of EPL stencil masks
Welsh, J. ; McCallum, M. ; Okada, M.
Pub. info.: Emerging Lithographic Technologies VII.  2  pp.999-1008,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037