1.

Conference Proceedings

Conference Proceedings
Mayhew, J.P. ; Rieger, M.L. ; Li, J.W. ; Zhang, L. ; Tang, Z.W. ; Shiely, J.P.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.336-344,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
2.

Conference Proceedings

Conference Proceedings
Kamat, V.G. ; Miloslavsky, A. ; Malhotra, V.K. ; Mayhew, J.P. ; Cote, M.L.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.279-289,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
3.

Conference Proceedings

Conference Proceedings
Rieger, M.L. ; Mayhew, J.P. ; Melvin, L.S. ; Lugg, R.M. ; Beale, D.F.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.617-627,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings

Conference Proceedings
Rieger, M.L. ; Gravoulet, V. ; Mayhew, J.P. ; Beale, D.F. ; Lugg, R.M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.132-137,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754