Search records | 東京工業大学附属図書館文献データベース

You can search for articles included in proceedings of international conferences and technical papers which Tokyo Tech Library holds.
Tokyo Tech members can obtain tables of contents of 17,000 foreign journals by SwetScan. Tokyo Tech Library does not cover all of them.
List of Searchable Databases

Clear Form

Search for other sites by same keyword(s).

CiNii Books

NDL Search

WebcatPlus

amazon

カーリル

WorldCat

Filter

Title:

Author:

ISBN / ISSN / Paper No:

Source Title:

Publisher:

Publication Year:

～

Clear Form

Type:

Conference Proceedings

Technical Paper

Academic Journal

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

14 results

Conference Proceedings

1. The impact of mask topography on binary reticles at the 65nm node

Word, J. ; Belledent, J. ; Trouiller, Y. ; Granik, Y. ; Toublan, O. ; Maurer, W.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.527-536, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

2. ORS and LfD as first steps towards DfM [6281-23]

Marz, R. ; Peter, K. ; Maurer, W.

Pub. info.:	EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.62810I-, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6281

Conference Proceedings

3. ION-PROJECTION LITHOGRAPHY FOR SUBMICRON MODIFICATION OF MATERIALS

Stengl, G. ; Loschner, H. ; Maurer, W. ; Wolf, P.

Pub. info.:	Energy beam-solid interactions and transient thermal processing/1984 : symposium held November 26-30, 1984, Boston, Massachusetts, U.S.A.. pp.533-538, 1985. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	35

Conference Proceedings

4. Failure prediction across process window for robust OPC

Shang, S.D. ; Granik, Y. ; Cobb, N.B. ; Maurer, W. ; Cui, Y. ; Liebmann, L.W. ; Oberschmidt, J.M. ; Singh, R.N. ; Vampatella, B.R.

Pub. info.:	Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA. pp.376-385, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5042

Conference Proceedings

5. OPC aware mask and wafer metrology

Maurer, W. ; Wiaux, V. ; Jonckheere, R.M. ; Philipsen, V. ; Hoffmann, T. ; Verhaegen, S. ; Ronse, K.G. ; England, J.G. ; Howard, W.B.

Pub. info.:	18th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.175-181, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4764

Conference Proceedings

6. Failure prediction across process window for robust OPC

Shang, S.D. ; Granik, Y. ; Cobb, N.B. ; Maurer, W. ; Cui, Y. ; Liebmann, L.W. ; Oberschmidt, J.M. ; Singh, R.N. ; Vampatella, B.R.

Pub. info.:	Optical Microlithography XVI. Part One pp.431-440, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

7. Alternatives to alternating phase-shift masks for 65 nm

Torres, J.A. ; Maurer, W.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.540-550, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

8. MEEF-based mask inspection

Maurer, W. ; Word, J. ; Schulze, S. F. ; Shang, S. D.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.98-106, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

Conference Proceedings

9. Assessment of OPC effectiveness using two-dimensional metrics

Wiaux, V. ; Philipsen, V. ; Jonckheere, R. ; Vandenberghe, G. ; Verhaegen, S. ; Hoffmann, T. ; Ronse, K. ; Howard, W.B. ; Maurer, W. ; Preil, M.E.

Pub. info.:	Optical Microlithography XV. Part One pp.395-406, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

10.

Conference Proceedings

10. Flows for model-based layout correction of mask proximity effects

Cobb, N.B. ; Maurer, W.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.956-964, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

14 results

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

Filtering by:

Author: Maurer, W.