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Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11. pp.1356-1363, 1997. Pennington, NJ. Electrochemical Society
Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium. pp.220-225, 1999. Pennington, NJ. Electrochemical Society
Ishii, M. ; Goto, K. ; Sakuraba, M. ; Matsuura, T. ; Murota, J. ; Koyanagi, M.
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ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology. pp.441-452, 1997. Pennington, NJ. Electrochemical Society
Jeong, Y. ; Sakuraba, M. ; Matsuura, T. ; Murota, J.
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Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.287-296, 2002. Pennington, NJ. Electrochemical Society