1.

Conference Proceedings
Conference Proceedings
1. New method for the quantitative evaluation of wafer pattern shape based on CAD data
Matsuoka, R. ; Takahashi, M. ; Uemoto, A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.540-546,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
2.

Conference Proceedings
Conference Proceedings
2. Development of the automatic recipe generation system for CD-SEM using design data [6152-191]
Matsuoka, R. ; Miyamoto, A. ; Nagatomo, W ; Morokuma, H. ; Sutani, T
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61524N-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
3.

Conference Proceedings
Conference Proceedings
3. Pattern shape comparison methods using SEM image
Ikeda, T. ; Kotani, T. ; Sato, T. ; Ueno, K. ; Matsuoka, R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.950-961,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038