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16 results

Conference Proceedings

1. Challenge to sub-0.1-ｦﾌm pattern fabrication using an alternating phase-shifting mask in ArF lithography

Matsuo,T. ; Nakazawa,K. ; Ogawa,T.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.302-309, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

2. Development of ZrSiO attenuated phase-shift mask for ArF excimer laser lithography

Fukuhara,N. ; Haraguchi,T. ; Kanayama,K. ; Matsuo,T. ; Takeuchi,S. ; Tomiyama,K. ; Saga,T. ; Hattori,Y. ; Ooshima,T. ; Otaki,M.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.979-986, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

3. Zr-based films for attenuated phase-shift mask

Matsuo,T. ; Ohkubo,K. ; Haraguchi,T. ; Ueyama,K.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.354-361, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

4. Feasibility study of an embedded transparent phase-shifting mask in ArF lithography

Matsuo,T. ; Ogawa,T. ; Morimoto,H.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.443-451, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

5. ZrSiO:a new and robust material for attenuated phase-shift mask in ArF Lithography

Onodera,T. ; Matsuo,T. ; Nakazawa,K. ; Miyazaki,J. ; Ogawa,T. ; Morimoto,H. ; Haraguchi,T. ; Fukuhara,N. ; Otaki,M. ; Takeuchi,S.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.337-343, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

6. High-silicon-concentration TSI process for 193-nm lithography

Mori,S. ; Morisawa,T. ; Matsuzawa,N.N. ; Kaimoto,Y. ; Endo,M. ; Matsuo,T. ; Kuhara,K. ; Ohfuji,T. ; Sasago,M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.587-594, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

7. Improved positive surface modification resist process for 193-nm lithography

Endo,M. ; Matsuo,T. ; Mori,S. ; Morisawa,T. ; Kuhara,K. ; Sasago,M. ; Shirai,M. ; Tsunooka,M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.534-545, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

8. Polymer design in surface modification resist process for ArF lithography

Matsuo,T. ; Endo,M. ; Mori,S. ; Kuhara,K. ; Sasago,M. ; Shirai,M. ; Tsunooka,M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.2-10, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

9. Electric field application to molten lithium borates

Katsumata,T. ; Suzuki,N. ; Shibasaki,M. ; Matsuo,T.

Pub. info.:	Materials research in low gravity II : 19-21 July 1999, San Diego, California. pp.242-249, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3792

10.

Conference Proceedings

10. CrOxFy as a material for attenuated phase-shift masks in ArF lithography

Nakazawa,K. ; Matsuo,T. ; Onodera,T. ; Morimoto,H. ; Mohri,H. ; Hatsuta,C. ; Hayashi,N.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.682-687, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

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