1.

Conference Proceedings
Conference Proceedings
1. Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication
Fritze,M. ; Burns,J.M. ; Wyatt,P.W. ; Astolfi,D.K. ; Forte,T. ; Yost,D. ; Davis,P. ; Curtis,A.V. ; Preble,D.M. ; Cann,S.G. ; Denault,S. ; Liu,H.-Y. ; Shaw,J.C. ; Sullivan,N.T. ; Mastovich,M.E.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.388-407,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Application of attenuated phase-shift masks to sub-0.18-ｦﾌm logic patterns
Fritze,M. ; Wyatt,P.W. ; Astolfi,D.K. ; Davis,P. ; Curtis,A.V. ; Preble,D.M. ; Cann,S.G. ; Denault,S. ; Chan,D. ; Shaw,J.C. ; Sullivan,N.T. ; Brandom,R. ; Mastovich,M.E.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1179-1192,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Secondary-electron image profiles using bias voltage technique in deep contact hole
Ko,Y.-U. ; Joy,D.C. ; Sullivan,N.T. ; Mastovich,M.E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.37-45,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
4.

Conference Proceedings
Conference Proceedings
4. Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography
Fritze,M. ; Tyrrell,B. ; Astolfi,D.K. ; Davis,P. ; Wheeler,B. ; Mallen,R. ; Jarmolowicz,J. ; Cann,S.G. ; Chan,D.Y. ; Rhyins,P.D. ; Mastovich,M.E. ; Sullivan,N.T. ; Brandom,R. ; Carney,C. ; Fritze,M. ; Blachowicz,B.A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.334-343,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344